Effect of in SITU DC and PDC substrate bias cleaning process on TiN coating adhesion in PVD system

This research compared the effect ofPDC and DC substrate biases applications at -500V and study the effect of PDC voltage variations (OV, -200V, -500V, -800V) during substrate cleaning on coating adhesion. The substrate and coating materials used were tungsten carbide(WC) and titanium nitride (TiN),...

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Main Author: Hanizam , Hashim
Format: Thesis
Language:en
Published: 2013
Subjects:
Online Access:http://eprints.utem.edu.my/id/eprint/15744/1/Effect%20of%20in%20SITU%20DC%20and%20PDC%20substrate%20bias%20cleaning%20process%20on%20TiN%20coating%20adhesion%20in%20PVD%20system006%2824%29.pdf
http://eprints.utem.edu.my/id/eprint/15744/
http://library.utem.edu.my:8000/elmu/index.jsp?module=webopac-d&action=fullDisplayRetriever.jsp&szMaterialNo=0000085767
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author Hanizam , Hashim
author_facet Hanizam , Hashim
author_sort Hanizam , Hashim
building UTEM Library
collection Institutional Repository
content_provider Universiti Teknikal Malaysia Melaka
content_source UTEM Institutional Repository
continent Asia
country Malaysia
description This research compared the effect ofPDC and DC substrate biases applications at -500V and study the effect of PDC voltage variations (OV, -200V, -500V, -800V) during substrate cleaning on coating adhesion. The substrate and coating materials used were tungsten carbide(WC) and titanium nitride (TiN), respectively. Aside from adhesion, data on surface roughness,surface energy, crystallite size and crystal orientation were also collected to further explain theexperimental results. Statistical analyses such T-Test, ANOV A, and Regressions Analysis were conducted on the collected data using Mini tab and EXCEL software. The results of this research indicated that coating adhesion on specimen using PDC as substrate bias exhibited significantly higher coating adhesion (7%) compared to that of the DC substrate specimen. In addition,substrate's surface roughness reduced by 38o/o, crystallite size reduced by 10% and surface energy increased by 5.7o/o that lead to the adhesion improvement trend from DC to PDC. The study also indicated that as PDC voltage increased, coating adhesion also increased linearly and the coefficient of determination R2 value of 0.961 between the two indicates a strong correlation. The results of PDC substrate bias also indicated linear correlations between surface roughness and surface energy to coating adhesion with R2 values of 0.982 and 0.903,respectively.
format Thesis
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institution Universiti Teknikal Malaysia Melaka
language en
publishDate 2013
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spelling my.utem.eprints-157442016-03-18T02:46:58Z http://eprints.utem.edu.my/id/eprint/15744/ Effect of in SITU DC and PDC substrate bias cleaning process on TiN coating adhesion in PVD system Hanizam , Hashim TJ Mechanical engineering and machinery This research compared the effect ofPDC and DC substrate biases applications at -500V and study the effect of PDC voltage variations (OV, -200V, -500V, -800V) during substrate cleaning on coating adhesion. The substrate and coating materials used were tungsten carbide(WC) and titanium nitride (TiN), respectively. Aside from adhesion, data on surface roughness,surface energy, crystallite size and crystal orientation were also collected to further explain theexperimental results. Statistical analyses such T-Test, ANOV A, and Regressions Analysis were conducted on the collected data using Mini tab and EXCEL software. The results of this research indicated that coating adhesion on specimen using PDC as substrate bias exhibited significantly higher coating adhesion (7%) compared to that of the DC substrate specimen. In addition,substrate's surface roughness reduced by 38o/o, crystallite size reduced by 10% and surface energy increased by 5.7o/o that lead to the adhesion improvement trend from DC to PDC. The study also indicated that as PDC voltage increased, coating adhesion also increased linearly and the coefficient of determination R2 value of 0.961 between the two indicates a strong correlation. The results of PDC substrate bias also indicated linear correlations between surface roughness and surface energy to coating adhesion with R2 values of 0.982 and 0.903,respectively. 2013 Thesis NonPeerReviewed text en http://eprints.utem.edu.my/id/eprint/15744/1/Effect%20of%20in%20SITU%20DC%20and%20PDC%20substrate%20bias%20cleaning%20process%20on%20TiN%20coating%20adhesion%20in%20PVD%20system006%2824%29.pdf Hanizam , Hashim (2013) Effect of in SITU DC and PDC substrate bias cleaning process on TiN coating adhesion in PVD system. Masters thesis, Universiti Teknikal Malaysia Melaka. http://library.utem.edu.my:8000/elmu/index.jsp?module=webopac-d&action=fullDisplayRetriever.jsp&szMaterialNo=0000085767
spellingShingle TJ Mechanical engineering and machinery
Hanizam , Hashim
Effect of in SITU DC and PDC substrate bias cleaning process on TiN coating adhesion in PVD system
title Effect of in SITU DC and PDC substrate bias cleaning process on TiN coating adhesion in PVD system
title_full Effect of in SITU DC and PDC substrate bias cleaning process on TiN coating adhesion in PVD system
title_fullStr Effect of in SITU DC and PDC substrate bias cleaning process on TiN coating adhesion in PVD system
title_full_unstemmed Effect of in SITU DC and PDC substrate bias cleaning process on TiN coating adhesion in PVD system
title_short Effect of in SITU DC and PDC substrate bias cleaning process on TiN coating adhesion in PVD system
title_sort effect of in situ dc and pdc substrate bias cleaning process on tin coating adhesion in pvd system
topic TJ Mechanical engineering and machinery
url http://eprints.utem.edu.my/id/eprint/15744/1/Effect%20of%20in%20SITU%20DC%20and%20PDC%20substrate%20bias%20cleaning%20process%20on%20TiN%20coating%20adhesion%20in%20PVD%20system006%2824%29.pdf
http://eprints.utem.edu.my/id/eprint/15744/
http://library.utem.edu.my:8000/elmu/index.jsp?module=webopac-d&action=fullDisplayRetriever.jsp&szMaterialNo=0000085767
url_provider http://eprints.utem.edu.my/