NANOSTRUCTURAL STUDIES OF SPUTTER-DEPOSITED NixAl1-x (0.5 ≤ x ≤ 1.0) ALLOY THIN FILMS
The nanostructural characteristics of direct-current magnetron sputter-deposited NixAl1-x (0.5 ≤ x ≤ 1.0) alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.5Al0.5 and the Ni0.8Al0.2 fi...
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| Main Authors: | , |
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| Format: | Article |
| Language: | en |
| Published: |
Universiti Putra Malaysia
2011
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| Subjects: | |
| Online Access: | http://eprints.utem.edu.my/id/eprint/10139/1/MJM_7.pdf http://eprints.utem.edu.my/id/eprint/10139/ http://www.myjurnal.my/public/browse-journal-view.php?id=103 |
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| Summary: | The nanostructural characteristics of direct-current magnetron sputter-deposited NixAl1-x (0.5 ≤ x ≤ 1.0) alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.5Al0.5 and the Ni0.8Al0.2 films in their low-thickness and as-deposited state. The lattice size approaches the bulk value when the film thickness increases or after vacuum annealing heat-treatment. The Ni0.8Al0.2 films have a nanocrystalline structure in which the ordered L12 phase appears upon annealing at above 500°C. The ordered B2 phase for Ni0.5Al0.5 and Ni5Al3 phase with orthorhombic structure for Ni0.65Al0.35 were found. |
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