APA (7th ed.) Citation

F, S., I, A., F.A, H., A, Z., & 36239165300. (2023). Analyze and optimize the silicide thickness in 45nm CMOS technology using Taguchi method.

Chicago Style (17th ed.) Citation

F, Salehuddin, Ahmad I, Hamid F.A, Zaharim A, and 36239165300. Analyze and Optimize the Silicide Thickness in 45nm CMOS Technology Using Taguchi Method. 2023.

MLA (9th ed.) Citation

F, Salehuddin, et al. Analyze and Optimize the Silicide Thickness in 45nm CMOS Technology Using Taguchi Method. 2023.