APA (7th ed.) Citation

C.W, L., H.M, C., M.C, J., S.P, K., J.-S, W., & 35722335000. (2023). An approximate method for solving unsteady transitional and rarefied flow regimes in pulsed pressure chemical vapor deposition process using the quiet direct simulation method.

Chicago Style (17th ed.) Citation

C.W, Lim, Cave H.M, Jermy M.C, Krumdieck S.P, Wu J.-S, and 35722335000. An Approximate Method for Solving Unsteady Transitional and Rarefied Flow Regimes in Pulsed Pressure Chemical Vapor Deposition Process Using the Quiet Direct Simulation Method. 2023.

MLA (9th ed.) Citation

C.W, Lim, et al. An Approximate Method for Solving Unsteady Transitional and Rarefied Flow Regimes in Pulsed Pressure Chemical Vapor Deposition Process Using the Quiet Direct Simulation Method. 2023.