F, S., I, A., F.A, H., A, Z., & 36239165300. (2023). Influence of HALO and source/drain implantation on threshold voltage in 45nm PMOS device.
Chicago Style (17th ed.) CitationF, Salehuddin, Ahmad I, Hamid F.A, Zaharim A, and 36239165300. Influence of HALO and Source/drain Implantation on Threshold Voltage in 45nm PMOS Device. 2023.
MLA (9th ed.) CitationF, Salehuddin, et al. Influence of HALO and Source/drain Implantation on Threshold Voltage in 45nm PMOS Device. 2023.
Warning: These citations may not always be 100% accurate.
