APA (7th ed.) Citation

H.A, E., B.Y, M., F, S., I, A., A, Z., F.A, H., & 36536722700. (2023). Optimizing 35nm NMOS devices V TH and I LEAK by controlling active area and halo implantation dosage.

Chicago Style (17th ed.) Citation

H.A, Elgomati, Majlis B.Y, Salehuddin F, Ahmad I, Zaharim A, Hamid F.A, and 36536722700. Optimizing 35nm NMOS Devices V TH and I LEAK by Controlling Active Area and Halo Implantation Dosage. 2023.

MLA (9th ed.) Citation

H.A, Elgomati, et al. Optimizing 35nm NMOS Devices V TH and I LEAK by Controlling Active Area and Halo Implantation Dosage. 2023.