High-k Dielectric Thickness and Halo Implant on Threshold Voltage Control
High-k dielectric oxides have been used to replace the widely used silicon dioxide (SiO2) gate dielectrics to overcome physical limits of transistor scaling. The thickness of high-k gate dielectric influences the threshold voltage (VTH) and off-state leakage current (IOFF). A device with high drive...
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Universiti Teknikal Malaysia Melaka
2023
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| author | Mah S.K. Ahmad I. Ker P.J. Noor Faizah Z.A. |
| author2 | 57191706660 |
| author_facet | 57191706660 Mah S.K. Ahmad I. Ker P.J. Noor Faizah Z.A. |
| author_sort | Mah S.K. |
| building | UNITEN Library |
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| content_provider | Universiti Tenaga Nasional |
| content_source | UNITEN Institutional Repository |
| continent | Asia |
| country | Malaysia |
| description | High-k dielectric oxides have been used to replace the widely used silicon dioxide (SiO2) gate dielectrics to overcome physical limits of transistor scaling. The thickness of high-k gate dielectric influences the threshold voltage (VTH) and off-state leakage current (IOFF). A device with high drive current (ION) and low IOFF gives a high on-off current ratio (ION/IOFF), which leads to a faster switching speed for the N-type Metal Oxide Semiconductor Field Effect Transistor (NMOS). In order to achieve the best ION/IOFF ratio for a predetermined range of VTH, halo implant was used to adjust the threshold voltage. The finding shows that optimum VTH and ION/IOFF ratio can be achieved by selecting the most suitable halo implant dose in a virtually fabricated 14nm gate-length La2O3-based NMOS device with varying high-k dielectric oxide thickness. � 2018 Universiti Teknikal Malaysia Melaka. All rights reserved. |
| format | Article |
| id | my.uniten.dspace-24198 |
| institution | Universiti Tenaga Nasional |
| publishDate | 2023 |
| publisher | Universiti Teknikal Malaysia Melaka |
| record_format | dspace |
| spelling | my.uniten.dspace-241982023-05-29T14:56:48Z High-k Dielectric Thickness and Halo Implant on Threshold Voltage Control Mah S.K. Ahmad I. Ker P.J. Noor Faizah Z.A. 57191706660 12792216600 37461740800 56395444600 High-k dielectric oxides have been used to replace the widely used silicon dioxide (SiO2) gate dielectrics to overcome physical limits of transistor scaling. The thickness of high-k gate dielectric influences the threshold voltage (VTH) and off-state leakage current (IOFF). A device with high drive current (ION) and low IOFF gives a high on-off current ratio (ION/IOFF), which leads to a faster switching speed for the N-type Metal Oxide Semiconductor Field Effect Transistor (NMOS). In order to achieve the best ION/IOFF ratio for a predetermined range of VTH, halo implant was used to adjust the threshold voltage. The finding shows that optimum VTH and ION/IOFF ratio can be achieved by selecting the most suitable halo implant dose in a virtually fabricated 14nm gate-length La2O3-based NMOS device with varying high-k dielectric oxide thickness. � 2018 Universiti Teknikal Malaysia Melaka. All rights reserved. Final 2023-05-29T06:56:48Z 2023-05-29T06:56:48Z 2018 Article 2-s2.0-85049382746 https://www.scopus.com/inward/record.uri?eid=2-s2.0-85049382746&partnerID=40&md5=499445c6905608a5ac9d53990e5af555 https://irepository.uniten.edu.my/handle/123456789/24198 10 2-Jun 1 5 Universiti Teknikal Malaysia Melaka Scopus |
| spellingShingle | Mah S.K. Ahmad I. Ker P.J. Noor Faizah Z.A. High-k Dielectric Thickness and Halo Implant on Threshold Voltage Control |
| title | High-k Dielectric Thickness and Halo Implant on Threshold Voltage Control |
| title_full | High-k Dielectric Thickness and Halo Implant on Threshold Voltage Control |
| title_fullStr | High-k Dielectric Thickness and Halo Implant on Threshold Voltage Control |
| title_full_unstemmed | High-k Dielectric Thickness and Halo Implant on Threshold Voltage Control |
| title_short | High-k Dielectric Thickness and Halo Implant on Threshold Voltage Control |
| title_sort | high-k dielectric thickness and halo implant on threshold voltage control |
| url_provider | http://dspace.uniten.edu.my/ |