Growth kinetic and composition of the interfacial layer for RF sputtering Al2O3 layer on germanium
Chemical cleaning; Deposition; Field effect transistors; Germanium oxides; Growth kinetics; Hafnium; Metal insulator boundaries; Photoelectrons; Photons; Sputtering; X ray photoelectron spectroscopy; Deposition time; Design/methodology/approach; Equivalent oxide thickness; Ge substrates; Interfacial...
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| Main Authors: | , , , , , , , , |
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Emerald Group Publishing Ltd.
2023
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