APA (7th ed.) Citation

K.H, G., H.J, L., S.K, L., P.C, T., S, R., C.Y, T., . . . 57069579300. (2023). Investigation of the effect of anodization time and annealing temperature on the physical properties of ZrO2 thin film on a Si substrate. Institute of Physics Publishing.

Chicago Style (17th ed.) Citation

K.H, Goh, Lee H.J, Lau S.K, Teh P.C, Ramesh S, Tan C.Y, Wong Y.H, and 57069579300. Investigation of the Effect of Anodization Time and Annealing Temperature on the Physical Properties of ZrO2 Thin Film on a Si Substrate. Institute of Physics Publishing, 2023.

MLA (9th ed.) Citation

K.H, Goh, et al. Investigation of the Effect of Anodization Time and Annealing Temperature on the Physical Properties of ZrO2 Thin Film on a Si Substrate. Institute of Physics Publishing, 2023.