N, A., I, A., B.Y, M., M.F, A., & 26422792900. (2023). Influence of Optimization of Process Parameters on Threshold Voltage for Development of HfO2/TiSi2 18 nm PMOS. EDP Sciences.
Chicago Style (17th ed.) CitationN, Atan, Ahmad I, Majlis B.Y, Azle M.F, and 26422792900. Influence of Optimization of Process Parameters on Threshold Voltage for Development of HfO2/TiSi2 18 Nm PMOS. EDP Sciences, 2023.
MLA (9th ed.) CitationN, Atan, et al. Influence of Optimization of Process Parameters on Threshold Voltage for Development of HfO2/TiSi2 18 Nm PMOS. EDP Sciences, 2023.
Warning: These citations may not always be 100% accurate.
