A.H.A, M., P.S, M., S, S., T, K., I, A., Z.A.N, F., . . . 36570222300. (2023). Effect of process parameter variability on the threshold voltage of downscaled 22nm PMOS using taguchi method. Institute of Electrical and Electronics Engineers Inc.
Chicago Style (17th ed.) CitationA.H.A, Maheran, Menon P.S, Shaari S, Kalaivani T, Ahmad I, Faizah Z.A.N, Apte P.R, and 36570222300. Effect of Process Parameter Variability on the Threshold Voltage of Downscaled 22nm PMOS Using Taguchi Method. Institute of Electrical and Electronics Engineers Inc, 2023.
MLA (9th ed.) CitationA.H.A, Maheran, et al. Effect of Process Parameter Variability on the Threshold Voltage of Downscaled 22nm PMOS Using Taguchi Method. Institute of Electrical and Electronics Engineers Inc, 2023.
Warning: These citations may not always be 100% accurate.