Effect of alignment mark architecture on alignment signal behavior in advanced lithography

Effect of alignment mark architecture on alignment signal behavior in advanced lithography

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Bibliographic Details
Main Authors: Normah, Ahmad, Uda, Hashim, Mohd Jeffery, Manaf, Kader Ibrahim, Abdul Wahab
Format: Article
Language:en
Published: Universiti Malaya 2009
Subjects:
Alignment mark
Alignment signal
Lithography
Lithography > Technique
Metal mark
Deposition
Online Access:http://dspace.unimap.edu.my/123456789/6836
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