Silicon nanostructures fabricated by Au and SiH4 co-deposition technique using hot-wire chemical vapor deposition

In this study, the fabrication of Si nanostructures by Au and SiH4 co-deposition technique using hot-wire chemical vapor deposition was demonstrated. A high deposition rate of 2.7 nm/s and a high density of silicon nanostructures with a diameter of about 140 nm were obtained at T-s of 250 degrees C....

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Bibliographic Details

Main Authors:	Chong, S.K., Goh, B.T., Aspanut, Z., Muhamad, M.R., Varghese, B., Sow, C.H., Dee, C.F., Rahman, S.A.
Format:	Article
Published:	2011
Subjects:	QC Physics
Online Access:	http://eprints.um.edu.my/7376/
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