Effects of Rf power on structural properties of Nc-Si:H Thin Films deposited by Layer-By-Layer (LbL) deposition technique

The effects of rf power on the structural properties of hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited using layer-by-layer ( LbL) deposition technique in a home-built plasma enhanced chemical vapor deposition (PECVD) system were investigated. The properties of the films were ch...

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Bibliographic Details

Main Authors:	Tong, G.B., Muhamad, M.R., Rahman, Saadah Abdul
Format:	Article
Published:	Penerbit Universiti Kebangsaan Malaysia 2012
Subjects:	QC Physics
Online Access:	http://eprints.um.edu.my/7348/
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