Effect of pre-deposited carbon layer on the formation of carbon nitride nanostructures prepared by radio-frequency plasma enhanced chemical vapour deposition

Nanostructured carbon nitride (CN(x)) thin films were prepared by radio-frequency plasma enhanced chemical vapour deposition (rf-PECVD) on crystal silicon (c-Si) substrates coated with a layer of hydrogenated amorphous carbon (a-C:H). The a-C:H layer was deposited by rf-PECVD from the discharge of p...

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Main Authors:	Khanis, Noor Hamizah, Ritikos, Richard, Othman, Maisara, Rashid, Nur Maisarah Abdul, Gani, Siti Meriam Ab, Muhamad, Muhamad Rasat, Rahman, Saadah Abdul
Format:	Article
Published:	Elsevier 2011
Subjects:	Q Science (General) QC Physics
Online Access:	http://eprints.um.edu.my/7337/ https://doi.org/10.1016/j.matchemphys.2011.06.030
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