Search Results - Ritikos, R.

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  1. 1
    Studies on optical and photoluminescence properties of a-CNx thin films

    Studies on optical and photoluminescence properties of a-CNx thin films by Rahman, Z.A., Ritikos, R., Rahman, S.A.

    Published 2009
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  2. 2
    Catalyst-free formation of vertically-aligned carbon nanorods as induced by nitrogen incorporation

    Catalyst-free formation of vertically-aligned carbon nanorods as induced by nitrogen incorporation by Ritikos, R., Rahman, S.A., Gani, S.M.A., Muhamad, M.R., Yap, Y.K.

    Published 2011
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  3. 3
    Electrical Characterization of Gold-DNA-Gold Structures in Presence of an External Magnetic Field by Means of I-V Curve Analysis

    Electrical Characterization of Gold-DNA-Gold Structures in Presence of an External Magnetic Field by Means of I-V Curve Analysis by Khatir, N.M., Banihashemian, S.M., Periasamy, V., Ritikos, R., Abd Majid, Wan Haliza, Rahman, S.A.

    Published 2012
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  4. 4
    Catalyst free carbon nitride nanostructures prepared by rf-PECVD technique on hydrogenated amorphous carbon template

    Catalyst free carbon nitride nanostructures prepared by rf-PECVD technique on hydrogenated amorphous carbon template by Khanis, N.H., Ritikos, R., Othman, M., Abdul Rashid, N.M., Ab. Gani, S.M., Rahman, Saadah Abdul

    Published 2013
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  5. 5
    Formation of nano-crystalline phase in hydrogenated amorphous silicon thin film by plasma focus ion beam irradiation

    Formation of nano-crystalline phase in hydrogenated amorphous silicon thin film by plasma focus ion beam irradiation by Ngoi, S.K., Yap, S.L., Goh, B.T., Ritikos, R., Rahman, S.A., Wong, C.S.

    Published 2012
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  6. 6
    Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature

    Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at... by Khanis, N.H., Ritikos, R., Kamal, S.A.A., Rahman, S.A.

    Published 2017
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  7. 7
    SnO2 Nanoparticles Decorated 2D Wavy Hierarchical Carbon Nanowalls with Enhanced Photoelectrochemical Performance

    SnO2 Nanoparticles Decorated 2D Wavy Hierarchical Carbon Nanowalls with Enhanced Photoelectrochemical Performance by Khanis, N.H., Ritikos, R., Chiu, W.S., Haw, C.Y., Rashid, N.M.A., Chia, M.Y., Khiew, P.S., Rahman, S.A.

    Published 2017
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  8. 8
    Effect of N2 flow rate on the properties of CNx thin films prepared by radio frequency plasma enhanced chemical vapor deposition from ethane and nitrogen

    Effect of N2 flow rate on the properties of CNx thin films prepared by radio frequency plasma enhanced chemical vapor deposition from ethane and nitrogen by Othman, M., Ritikos, R., Khanis, N.H., Rashid, N.M.A., Gani, S.M.A., Rahman, S.A.

    Published 2013
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  9. 9
    Effects of thermal annealing on the properties of highly reflective Nc-Si: H/A-Cnx: H multilayer films prepared by rf PECVD technique

    Effects of thermal annealing on the properties of highly reflective Nc-Si: H/A-Cnx: H multilayer films prepared by rf PECVD technique by Rashid, N.M.A., Ritikos, R., Goh, B.T., Gani, S.M.A., Muhamad, M.R., Rahman, S.A.

    Published 2011
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  10. 10
    Highly reflective nc-Si:H/a-CNx:H multilayer films prepared by r.f. PECVD technique

    Highly reflective nc-Si:H/a-CNx:H multilayer films prepared by r.f. PECVD technique by Ritikos, R., Goh, B.T., Sharif, K.A.M., Muhamad, M.R., Rahman, S.A.

    Published 2009
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  11. 11
    Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. Power

    Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. Power by Rashid, N.M.A., Ritikos, R., Othman, M., Khanis, N.H., Gani, S.M.A., Muhamad, M.R., Rahman, S.A.

    Published 2013
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