Search Results - Ramzan, Mat Ayub

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  1. 1
    Borophosphosilicate glass (BPSG) reflow characterization for submicron CMOS technology

    Borophosphosilicate glass (BPSG) reflow characterization for submicron CMOS technology by Uda, Hashim, Ramzan, Mat Ayub, Nik Hazura, Nik Hamat

    Published 2009
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  2. 2
    Development of MEMS Manifold Absolute Pressure Sensor (MAPs) Prototype

    Development of MEMS Manifold Absolute Pressure Sensor (MAPs) Prototype by Zaliman, Sauli, Assoc. Prof., Hasnizah, Aris, Johari, Adnan, Assoc. Prof. Dr., Poopalan, Prabakaran, Assoc. Prof. Dr., Ramzan, Mat Ayub, Rizalafande, Che Ismail, Sohiful Anuar, Zainol Murad, Azuwir, Md. Nor, Abu Hassan, Abdullah, Mohd. Hatta, Musa, Razaidi, Hussin

    Published 2010
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  3. 3
    Development of MEMS Manifold Absolute Pressure Sensor (MAPs) Prototype

    Development of MEMS Manifold Absolute Pressure Sensor (MAPs) Prototype by Zaliman, Sauli, Assoc. Prof., Hasnizah, Aris, Johari, Adnan, Assoc. Prof. Dr., Poopalan, Prabakaran, Assoc. Prof. Dr., Ramzan, Mat Ayub, Rizalafande, Che Ismail, Sohiful Anuar, Zainol Murad, Azuwir, Md. Nor, Abu Hassan, Abdullah, Mohd. Hatta, Musa, Razaidi, Hussin

    Published 2010
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  4. 4
    Gate Oxide Integrity (GOI) Characterization For Deep Submicron CMOS Device

    Gate Oxide Integrity (GOI) Characterization For Deep Submicron CMOS Device by Norain Mohd Saad

    Published 2008
    Other Authors: “…Ramzan Mat Ayub (Advisor)…”
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  5. 5
    Polysilicon Process Development – The Effect Of PECVD Process Parameters On The Film Characteristics

    Polysilicon Process Development – The Effect Of PECVD Process Parameters On The Film Characteristics by Mujahidun Mashuri

    Published 2008
    Other Authors: “…Ramzan Mat Ayub (Advisor)…”
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  6. 6
    The study of the effect of MOS transistor scaling on the critical device parameters

    The study of the effect of MOS transistor scaling on the critical device parameters by Zazurina Abd Rahman

    Published 2008
    Other Authors: “…Ramzan Mat Ayub (Advisor)…”
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  7. 7
    The Effect of Process Parameters on Metal Step Coverage for Aluminum by Evaporation Technique

    The Effect of Process Parameters on Metal Step Coverage for Aluminum by Evaporation Technique by Noraishah Azman

    Published 2008
    Other Authors: “…Ramzan Mat Ayub (Advisor)…”
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  8. 8
    Polysilicon process development for floating gate memory devices

    Polysilicon process development for floating gate memory devices by Zarimawaty, Zailan, Ramzan, Mat Ayub, Mohd Rosydi, Zakaria

    Published 2010
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