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    Influence of Optimization of Process Parameters on Threshold Voltage for Development of HfO2/TiSi2 18 nm PMOS

    Influence of Optimization of Process Parameters on Threshold Voltage for Development of HfO2/TiSi2 18 nm PMOS by Atan N., Ahmad I., Majlis B.Y., Azle M.F.

    Published 2023
    Conference Paper
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